Chemical Gas Purification

Catalysts and Adsorbents for Technical Gases

Chemical_Gas_Purification_Medium

Clariant offers a variety of catalysts and adsorbents for use in chemical production. Clariant’s EnviCat® catalysts and Actisorb® adsorbents address the high demands created by technical gases. These products are capable of reducing the level of substances such as hydrocarbons, hydrogen, oxygen, carbon monoxide or sulphur compounds, in some cases to parts per billion (ppb).

Building on decades of research and practical application, Clariant has developed products providing mechanical stability and durability to ensure efficient and reliable purification of technical gases.

CO2 for use in urea synthesis

Following the steam reforming process to produce hydrogen from a hydrocarbon stream, CO2 is separated using pressure swing adsorption (PSA) or gas scrubbing. This CO2 must be purified – removing such impurities as H2, hydrocarbons, and CO before it is reused for the urea synthesis process.

EnviCat® catalysts remove trace impurities to achieve the necessary purity.

CO2 from natural sources – bioethanol manufacture

Ethanol and CO2 are produced by fermenting the sugar and starch components of plant-based materials. After separating the CO2 with the aid of a thermal separation process, some impurities may remain such as residual ethanol, other hydrocarbons, sulfur compounds and oxygen. These trace impurities must be removed from the CO2 before it can be used for food-grade applications, such as the beverage industry.

O2 produced by electrolysis

High-purity oxygen is required for various chemical processes. Any traces of hydrogen remaining as a result of electrolysis must therefore be reliably removed.

Iodine Absorption in Nuclear Power Plants

For the removal of radioactive iodine in nuclear power plants and reprocessing plants there is a series of adsorber systems available, proven over decades. These are based on silver or potassium iodide, supported by acid resistant carriers. Products include AC 6120® and DSM11.

Semiconductor Production

Also offered are chemical adsorbents used in the production of semiconductors, particularly during the chemical vapor deposition process. Clariant’s adsorbents can chemically adsorb harmful gas such as hydrides and halogen compounds from semiconductor process, including such harmful chemicals as silane, phosphine, metal hydrides, arsine and perfluorinated compounds (PFCs). These systems can be compact and lightweight and can help reduce energy costs.

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